Thermal Decomposition of Silicon-rich Oxides Deposited by the LPCVD Method
نویسندگان
چکیده
منابع مشابه
Silicon nanocrystals by thermal annealing of Si-rich silicon oxide prepared by the LPCVD method
The Si-rich silicon oxide (SiOx) thin films are prepared on silicon crystalline substrates by low pressure chemical vapor deposition (LPCVD) method. The oxygen concentration x are controlled by the ratio of the partial pressures of N2O and SiH4 gases in the reaction chamber. In order to induce the phase separation on SiO2 and Si nanostructures the samples are annealed at the temperatures 900– 1...
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ژورنال
عنوان ژورنال: Croatica Chemica Acta
سال: 2012
ISSN: 0011-1643,1334-417X
DOI: 10.5562/cca1969